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Provided as a femtosecond light source that can freely use only the oscillators of the PHAROS series. Robust and industrial-grade mechanical design.
Equipped with a second harmonic wave (515nm) option (HG-FLINT) that allows for automatic switching. It can be widely used in time-resolved spectroscopy, nonlinear optics, and microstructure processing, among other applications.
A high-power femtosecond laser with an industrial-grade unibody design that integrates everything from the oscillator to the amplifier into a single enclosure.
The high-efficiency cavity design dramatically reduces the size. It is also easy to assemble and optimized for mass production, making it ideal for industrial applications as well as scientific applications. In industrial applications that require ultra-fast pulses with beam stability, the built-in pulse picker allows for control of output and energy, enabling stable beam quality and output stability unaffected by environmental conditions. By adding a flexible and highly adaptable BiBurst function, it provides new solutions for micro-machining applications in new high-tech manufacturing industries (such as home appliances, IC chip manufacturing, stent cutting, surface functionalization, next-generation display factories, quantum computers, etc.). Scalability in material processing: High-precision micro-machining is possible for various applications such as drilling and cutting of metals, ceramics, sapphire, and glass, material ablation for mass spectrometry, internal processing for IC chip manufacturing, and processing of multilayer structural materials. I-OPA is an industrial-grade optical parametric amplifier that can be directly attached to CARBIDE. It allows for flexible wavelength tuning and is used in spectroscopic analysis and micro-spectroscopy, making it ideal for multiphoton microscopy.
A high pulse repetition rate and high peak power industrial-grade DPSS picosecond laser, designed for diode excitation, ensuring long lifespan and suitability for extended use.
A compact design that is robust and hermetically sealed allows for use in various industrial material processing. ● Wavelength: 1064nm, harmonic options (532/355nm) ● Output: 10–40W@1064nm, 8–25W@532nm, 5–15W@355nm ● Maximum pulse energy: 130μJ@100kHz, 50μJ@800kHz ● Pulse repetition: 100kHz–2MHz ● Pulse width: <10–15ps@1064nm ● Excellent focusing characteristics: M2 <1.3 ● Compact and sealed robust package design ● Fully removable and closely connected structure ● Burst mode compatible ● Equipped with a process shutter Applications ■ Cutting and drilling of brittle and transparent materials ■ Micromachining ■ Thin film processing ■ Patterning
Developed for industrial processing, it is easy to operate and achieves long-term maintenance-free performance, maintaining high stability with a robust casing even in a 24/7 operating environment.
High power can be obtained at high repetition rates (kHz), making it suitable for various applications such as laser ablation and micromachining. ■ Drilling and metal microparticle processing ■ Cutting ■ Patterning (semiconductors, PC boards) ■ Surface microstructures ■ Ablation ■ Micromachining ■ Solar panels Applications (UV) ■ Cutting of OLEDs ■ Structural processing of sapphire ■ Micromachining of ceramics
